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http://www.repositorio.ufop.br/jspui/handle/123456789/7349| Título : | Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. |
| Autor : | Manhabosco, Taíse Matte Muller, Iduvirges Lourdes |
| Fecha de publicación : | 2009 |
| Citación : | MANHABOSCO, T. M.; MÜLLER, I. L. Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. Journal of Materials Science, v. 44, n. 1, p. 2931-2937, jun. 2009. Disponível em: <https://link.springer.com/article/10.1007/s10853-009-3388-9>. Acesso em: 10 mar. 2017. |
| Resumen : | In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film. |
| URI : | http://www.repositorio.ufop.br/handle/123456789/7349 |
| metadata.dc.identifier.uri2: | https://link.springer.com/article/10.1007/s10853-009-3388-9 |
| metadata.dc.identifier.doi: | https://doi.org/10.1007/s10853-009-3388-9 |
| ISSN : | 1573-4803 |
| Aparece en las colecciones: | DEFIS - Artigos publicados em periódicos |
Ficheros en este ítem:
| Fichero | Descripción | Tamaño | Formato | |
|---|---|---|---|---|
| ARTIGO_DepositionThinCobalt.pdf Restricted Access | 313,38 kB | Adobe PDF | Visualizar/Abrir |
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