Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques.

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Título:	Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques.
Autor(es):	Manhabosco, Taíse Matte Muller, Iduvirges Lourdes
Data do documento:	2009
Referência:	MANHABOSCO, T. M.; MÜLLER, I. L. Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. Journal of Materials Science, v. 44, n. 1, p. 2931-2937, jun. 2009. Disponível em: <https://link.springer.com/article/10.1007/s10853-009-3388-9>. Acesso em: 10 mar. 2017.
Resumo:	In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film.
URI:	http://www.repositorio.ufop.br/handle/123456789/7349
Link para o artigo:	https://link.springer.com/article/10.1007/s10853-009-3388-9
DOI:	https://doi.org/10.1007/s10853-009-3388-9
ISSN:	1573-4803
Aparece nas coleções:	DEFIS - Artigos publicados em periódicos

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