Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques.

dc.contributor.author	Manhabosco, Taíse Matte
dc.contributor.author	Muller, Iduvirges Lourdes
dc.date.accessioned	2017-03-10T13:05:25Z
dc.date.available	2017-03-10T13:05:25Z
dc.date.issued	2009
dc.description.abstract	In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film.	pt_BR
dc.identifier.citation	MANHABOSCO, T. M.; MÜLLER, I. L. Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. Journal of Materials Science, v. 44, n. 1, p. 2931-2937, jun. 2009. Disponível em: <https://link.springer.com/article/10.1007/s10853-009-3388-9>. Acesso em: 10 mar. 2017.	pt_BR
dc.identifier.doi	https://doi.org/10.1007/s10853-009-3388-9
dc.identifier.issn	1573-4803
dc.identifier.uri	http://www.repositorio.ufop.br/handle/123456789/7349
dc.identifier.uri2	https://link.springer.com/article/10.1007/s10853-009-3388-9	pt_BR
dc.language.iso	en_US	pt_BR
dc.rights	restrito	pt_BR
dc.title	Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques.	pt_BR
dc.type	Artigo publicado em periodico	pt_BR

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