Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques.
dc.contributor.author | Manhabosco, Taíse Matte | |
dc.contributor.author | Muller, Iduvirges Lourdes | |
dc.date.accessioned | 2017-03-10T13:05:25Z | |
dc.date.available | 2017-03-10T13:05:25Z | |
dc.date.issued | 2009 | |
dc.description.abstract | In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film. | pt_BR |
dc.identifier.citation | MANHABOSCO, T. M.; MÜLLER, I. L. Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. Journal of Materials Science, v. 44, n. 1, p. 2931-2937, jun. 2009. Disponível em: <https://link.springer.com/article/10.1007/s10853-009-3388-9>. Acesso em: 10 mar. 2017. | pt_BR |
dc.identifier.doi | https://doi.org/10.1007/s10853-009-3388-9 | |
dc.identifier.issn | 1573-4803 | |
dc.identifier.uri | http://www.repositorio.ufop.br/handle/123456789/7349 | |
dc.identifier.uri2 | https://link.springer.com/article/10.1007/s10853-009-3388-9 | pt_BR |
dc.language.iso | en_US | pt_BR |
dc.rights | restrito | pt_BR |
dc.title | Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. | pt_BR |
dc.type | Artigo publicado em periodico | pt_BR |
Arquivos
Pacote Original
1 - 1 de 1
Nenhuma Miniatura disponível
- Nome:
- ARTIGO_DepositionThinCobalt.pdf
- Tamanho:
- 313.38 KB
- Formato:
- Adobe Portable Document Format
Licença do Pacote
1 - 1 de 1
Nenhuma Miniatura disponível
- Nome:
- license.txt
- Tamanho:
- 924 B
- Formato:
- Item-specific license agreed upon to submission
- Descrição: