Please use this identifier to cite or link to this item: http://www.repositorio.ufop.br/handle/123456789/7349
Title: Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques.
Authors: Manhabosco, Taíse Matte
Muller, Iduvirges Lourdes
Issue Date: 2009
Citation: MANHABOSCO, T. M.; MÜLLER, I. L. Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. Journal of Materials Science, v. 44, n. 1, p. 2931-2937, jun. 2009. Disponível em: <https://link.springer.com/article/10.1007/s10853-009-3388-9>. Acesso em: 10 mar. 2017.
Abstract: In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film.
URI: http://www.repositorio.ufop.br/handle/123456789/7349
metadata.dc.identifier.uri2: https://link.springer.com/article/10.1007/s10853-009-3388-9
ISSN: 15734803
Appears in Collections:DEFIS - Artigos publicados em periódicos

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