Electronic band tuning and multivalley raman scattering in monolayer transition metal dichalcogenides at high pressures.

Resumo
Transition metal dichalcogenides (TMDs) possess spin-valley locking and spin-split K/K′ valleys, which have led to many fascinating physical phenomena. However, the electronic structure of TMDs also exhibits other conduction band minima with similar properties, the Q/Q′ valleys. The intervalley K−Q scattering enables interesting physical phenomena, including multivalley superconductivity, but those effects are typically hindered in monolayer TMDs due to the large K−Q energy difference (ΔEKQ). To unlock elusive multivalley phenomena in monolayer TMDs, it is desirable to reduce ΔEKQ, while being able to sensitively probe the valley shifts and the multivalley scattering processes. Here, we use high pressure to tune the electronic properties of monolayer MoS2 and WSe2 and probe K−Q crossing and multivalley scattering via double-resonance Raman (DRR) scattering. In both systems, we observed a pressure-induced enhancement of the double-resonance LA and 2LA Raman bands, which can be attributed to a band gap opening and ΔEKQ decrease. First-principles calculations and photoluminescence measurements corroborate this scenario. In our analysis, we also addressed the multivalley nature of the DRR bands for WSe2. Our work establishes the DRR 2LA and LA bands as sensitive probes of strain-induced modifications to the electronic structure of TMDs. Conversely, their intensity could potentially be used to monitor the presence of compressive or tensile strain in TMDs. Furthermore, the ability to probe K−K′ and K−Q scattering as a function of strain shall advance our understanding of different multivalley phenomena in TMDs such as superconductivity, valley coherence, and valley transport.
Descrição
Palavras-chave
Transition metal dichalcogenides - TMDs, Strain, Double-resonance, Multivalley physics
Citação
MARTINS, L. G. P. et al. Electronic band tuning and multivalley raman scattering in monolayer transition metal dichalcogenides at high pressures. ACS Nano, v. 16, n. 5, p. 8064-8075, 2022. Disponível em: <https://pubs.acs.org/doi/full/10.1021/acsnano.2c01065>. Acesso em: 06 jul. 2022.